| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a porous layer of a nanostructure on a surface of a silicon substrate (Si wafer) by making a solution containing no catalyst metal such as platinum act. <P>SOLUTION: A surface of an Si wafer is treated by a step of making at least one aqueous solution containing ammonia and selected from a group of hydrogen peroxide act on the surface of the Si wafer, thereby forming a fine porous layer of a nanostructure on the surface of the Si wafer. Thus, a reflectance in a visible light region on the surface of the Si wafer can be reduced to 5-8%. <P>COPYRIGHT: (C)2013,JPO&INPIT |
