发明名称 MASK AND MASK MEMBER USED FOR THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To make it possible to form a thin film pattern with high definition. <P>SOLUTION: There is provided a mask 1 for forming a thin film pattern having a fixed shape on a substrate, which comprises a resin film 2 transmitting visible light and a holding member 3 constituted by a plate body in which penetrating openings 5 larger than the thin film pattern are formed in correspondence with a predetermined thin film pattern formation region on the substrate and which holds the film 2, wherein the film 2 has an opening pattern 4 having the same shape as the thin film pattern inside the openings 5 of the holding member 3 in correspondence with the thin film pattern formation region on the substrate. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013083704(A) 申请公布日期 2013.05.09
申请号 JP20110221883 申请日期 2011.10.06
申请人 V TECHNOLOGY CO LTD 发明人 KAJIYAMA KOICHI;MIZUMURA MICHINOBU;KUDO SHUJI;KIMURA ERIKO
分类号 G03F1/68;G03F7/20 主分类号 G03F1/68
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