| 摘要 |
An imprint method of transferring a pattern formed on a mold onto a resin on a substrate. The substrate is held on a holding surface in a holding step. A shape of a substrate-side pattern area where the pattern is formed on the substrate is deformed in a deforming step. A resin on the deformed substrate-side pattern area is brought into contact with the mold in a contacting step. The resin is cured in a curing step, and the mold is released from the resin in contact with the mold in a mold-releasing step. In the deforming step, a deformation force, which is greater than a maximum static frictional force acting between a rear surface of the substrate corresponding to the substrate-side pattern area and the holding surface, is applied to the substrate in a direction along the surface thereof.
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