| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus and method for manufacturing a template which has higher pattern precision by controlling an etching rate at the surface of a substrate in dry-etching processing even if the substrate has unevenness on its back surface. <P>SOLUTION: According to one embodiment, the apparatus for manufacturing the template includes a vacuum chamber, an electrode and an adjustor. The vacuum chamber can maintain an atmosphere depressurized below atmospheric pressure. The vacuum chamber includes an inlet and an exhaust port of a reactive gas. The electrode is provided in the vacuum chamber. A high frequency voltage is applied to the electrode. The adjustor is mainly composed of an insulator. The adjustor is inserted into a recess formed at a back surface of the side of the electrode of the substrate placed on the electrode. <P>COPYRIGHT: (C)2013,JPO&INPIT |
