| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an improved measurement system in a lithographic apparatus. <P>SOLUTION: A lithographic apparatus includes a support configured to support a patterning device capable of adding a pattern to a cross-section of a radiation beam to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a measurement system which has a measurement radiation system to provide a measurement radiation beam, at least two reflectors to reflect a portion of the measurement beam between the reflectors, and a detector to detect a wavelength of at least a portion of the measurement beam transmitted through one of the reflectors. <P>COPYRIGHT: (C)2013,JPO&INPIT |
