| 发明名称 |
METHOD FOR CONTROLLING A REACTIVE HIGH-POWER PULSED MAGNETRON SPUTTER PROCESS AND CORRESPONDING DEVICE |
| 摘要 |
Method for regulating a reactive high performance pulsed sputtering process comprises changing the discharge performance as an adjusting parameter whilst the pulse frequency of the discharge is varied. An independent claim is also included for a device for reactive high performance pulsed sputtering. |
| 申请公布号 |
EP2036113(B1) |
申请公布日期 |
2013.05.08 |
| 申请号 |
EP20070764755 |
申请日期 |
2007.06.20 |
| 申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
发明人 |
RUSKE, FLORIAN;SITTINGER, VOLKER;SZYSZKA, BERND |
| 分类号 |
H01J37/34;C23C14/00;C23C14/34 |
主分类号 |
H01J37/34 |
| 代理机构 |
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