发明名称 Facet mirror e.g. field facet mirror, for channel-wise reflection of light radiation in UV micro-lithographic projection exposure system, has displaceable micro mirrors whose facet reflecting surfaces exhibit specific area
摘要 <p>The mirror e.g. field facet mirror (19), has a set of simple facets (38e) and a set of composite facets (38z) comprising two sets of facet reflecting surfaces, respectively. The facet reflecting surfaces of the composite facets are assembled to a set of single reflecting surfaces of displaceable micro mirrors (28). Facet reflecting surfaces of the simple facets and the single reflecting surfaces of the displaceable micro mirrors exhibit areas of about 10 and 5 square mm, respectively, where number of simple facets lies within a range of 20-1000. Independent claims are also included for the following: (1) a lighting system (2) a method for lighting an object field (3) an optical system (4) a method for manufacturing a micro or nano-structured component.</p>
申请公布号 DE102012207511(A1) 申请公布日期 2013.05.08
申请号 DE201210207511 申请日期 2012.05.07
申请人 CARL ZEISS SMT GMBH 发明人 PATRA, MICHAEL;EISENMENGER, JOHANNES
分类号 G02B26/08;G02B5/09;G03F7/20 主分类号 G02B26/08
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