SELF-CROSSLINKING POLYMER, RESIST UNDER-LAYER COMPOSITION INCLUDING THE SAME, AND METHOD FOR FORMING PATTERN USING THE SAME

摘要

PURPOSE: A self-crosslinking polymer is provided to form an underlayer(hard mask) by having excellent etching resistance and thermal stability. CONSTITUTION: A self-crosslinking polymer comprises a repeating unit represented by chemical formula 1. In chemical formula 1, each of A and B is independently halogen atom or hetero atom-substituted or unsubstituted C4-20 monocyclic or polycyclic hydrocarbon group; each of R1 and R2 is an independently hydrogen atom, hydroxide group, or halogen atom or hetero atom-substituted or unsubstituted C1-20 branched, monocyclic or polycyclic saturated or unsaturated hydrocarbon group.