发明名称 |
MASK ALIGNMENT OPTICAL SYSTEM |
摘要 |
PURPOSE: A mask alignment optical system is provided to perform an alignment process with a metal mask by an image due to transmissive light of an alignment mark installed on a part of a substrate and a metal mask mark installed on a part of the metal mask. CONSTITUTION: A vacuum deposition chamber(1) deposits deposition materials on a substrate. A fixed frame(101) is formed around a metal mask. L-shaped crucibles(103) are formed on four corners of the fixed frame. A stage(201) mounts the substrate. The L-shaped crucible is formed on the stage to correspond to the crucible of the fixed frame. An alignment process with the metal mask is performed by an image of an alignment mark due to light induced to the crucibles on the fixed frame and the stage. [Reference numerals] (AA) Evaporation source |
申请公布号 |
KR20130047601(A) |
申请公布日期 |
2013.05.08 |
申请号 |
KR20120118859 |
申请日期 |
2012.10.25 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
MATSUMOTO FUSASHIGE;KAMEYAMA HIROKI;JUNG, JAE HOON;LEE, SANG WOO |
分类号 |
H01L51/56;H05B33/10 |
主分类号 |
H01L51/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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