发明名称 |
A process for separating a template from a substrate during imprint lithography, and associated imprint lithography process |
摘要 |
<p>An orientation stage, for achieving fine movement and alignment of a template in an imprint lithography process, comprising a first flexure member (126) with first and second arms (172, 174) extending therefrom, each arm including a first set of flexure joints (160) which provide pivotal motion of said first flexure member about a first orientation axis (180). The orientation stage also comprises a second flexure member (128) having third and fourth arms (202, 204) extending therefrom, each arm including a second set of flexure joints (162) which provide pivotal motion of said second flexure member about a second orientation axis (200). Use of the orientation stage is also described.</p> |
申请公布号 |
EP1240550(B1) |
申请公布日期 |
2013.05.08 |
申请号 |
EP20000976753 |
申请日期 |
2000.10.30 |
申请人 |
THE BOARD OF REGENTS OF THE UNIVERSITY OF TEXAS SYSTEM |
发明人 |
CHOI, BYUNG, JIN;SREENIVASAN, SIDLGATA, V.;JOHNSON, STEPHEN C. |
分类号 |
G03F1/00;G03F7/20;G03F7/00;G03F9/00;H01L21/027;H02N2/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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