| 摘要 |
<p>PURPOSE: A composition for a resist under layer is provided to improve exposure amount and resolution and to reduce residues, thereby improving film density, solvent eruption, and exposure performance. CONSTITUTION: A thermal acid generator-bound monomer is represented by chemical formula 1. A polymer has a part for coupling with the thermal acid generator-bound monomer, represented by chemical formula 2. The content of a branched chain which has the part for coupling with the thermal acid generator-bound monomer is 0.5-20 moles based on the content of a branched chain which does not have the part for coupling with the thermal acid generator-bound monomer. The polymer has a weight average molecular weight of 3,000-200,000. A composition for a resist underlayer comprises the polymer and a solvent. The content of the polymer is 0.3-20 parts by weight based on 100.0 parts by weight of the solvent.</p> |
