发明名称 |
Method of slimming radiation-sensitive material lines in lithographic applications |
摘要 |
A method and system for patterning a substrate using a radiation-sensitive material is described. The method and system include forming a layer of radiation-sensitive material on a substrate, exposing the layer of radiation-sensitive material to a pattern of radiation, and then performing a post-exposure bake following the exposing. The imaged layer of radiation-sensitive material is then developed to remove either a region having high radiation exposure or a region having low radiation exposure to form radiation-sensitive material lines. An exposure gradient within the radiation-sensitive material lines is then removed, followed by slimming the radiation-sensitive material lines. |
申请公布号 |
US8435728(B2) |
申请公布日期 |
2013.05.07 |
申请号 |
US201113077833 |
申请日期 |
2011.03.31 |
申请人 |
CARCASI MICHAEL A.;RATHSACK BENJAMIN M.;SOMERVELL MARK H.;TOKYO ELECTRON LIMITED |
发明人 |
CARCASI MICHAEL A.;RATHSACK BENJAMIN M.;SOMERVELL MARK H. |
分类号 |
G03F7/26 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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