| 摘要 |
PURPOSE: A substrate processing apparatus is provided to prevent the reduction of the uniformity of a film due to changes in a gap between a first plate and the inner wall of a reaction chamber according the thermal expansion of the first plate. CONSTITUTION: A substrate processing apparatus includes a reaction chamber(10), a substrate support unit(40), a lifting movement assembly, and a plate movement assembly. The base plate support unit has a first plate(41) and a first plate support unit(42). The first plate is installed inside the reaction chamber and settled with the substrate. The first plate support unit is extended from the lower part of the first plate through a through hole to the outside of the reaction chamber. The plate movement assembly moves the first plate support unit so that the first plate can make at least one movement between the horizontal movement towards the plate plane and/or the rotational movement around the axis which is perpendicular to the direction of the plate plane.
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