THERMAL ACID GENERATOR BOUND MONOMER AND POLYMER OBTAINED FROM THE THERMAL ACID GENERATOR BOUND MONOMER AND THE RESIST UNDERLAYER COMPOSITION INCLUDING THE POLYMER AND METHOD OF FORMING PATTERNS USING THE RESIST UNDERLAYER COMPOSITION

摘要

PURPOSE: A composition for a resist underlayer is provided to improve lithography performance, film density, solvent eruption performance, and exposure performance. CONSTITUTION: A composition for a resist underlayer comprises a polymer obtained from a thermal acid generator-bound monomer, and a solvent. A patterning method comprises a step of providing a material layer on a substrate; a step of applying the composition on the material layer; a step of forming a resist underlayer through heat treatment; a step of forming a resist layer on the resist underlayer; a step of forming a resist pattern by exposure and development; a step of selectively removing the resist underlayer to expose the material layer; and a step of etching the exposed material.