发明名称 Non-volatile semiconductor stacked memory device having two semiconductor pillars in a through hole and method for manufacturing same
摘要 A nonvolatile semiconductor memory device includes: a semiconductor substrate; a stacked body provided on the semiconductor substrate, the stacked body having electrode films and insulating films being alternately stacked; a first and second semiconductor pillars; and a first and second charge storage layers. The first and second semiconductor pillars are provided inside a through hole penetrating through the stacked body in a stacking direction of the stacked body. The through hole has a cross section of an oblate circle, when cutting in a direction perpendicular to the stacking direction. The first and second semiconductor pillars face each other in a major axis direction of the first oblate circle. The first and second semiconductor pillars extend in the stacking direction. The first and second charge storage layers are provided between the electrode film and the first and second semiconductor pillars, respectively.
申请公布号 US8436414(B2) 申请公布日期 2013.05.07
申请号 US20100706127 申请日期 2010.02.16
申请人 TANAKA HIROYASU;AOCHI HIDEAKI;KATSUMATA RYOTA;KIDOH MASARU;KITO MASARU;FUKUZUMI YOSHIAKI;KOMORI YOSUKE;ISHIDUKI MEGUMI;FUJIWARA TOMOKO;MATSUNAMI JUNYA;KIRISAWA RYOUHEI;KABUSHIKI KAISHA TOSHIBA 发明人 TANAKA HIROYASU;AOCHI HIDEAKI;KATSUMATA RYOTA;KIDOH MASARU;KITO MASARU;FUKUZUMI YOSHIAKI;KOMORI YOSUKE;ISHIDUKI MEGUMI;FUJIWARA TOMOKO;MATSUNAMI JUNYA;KIRISAWA RYOUHEI
分类号 H01L29/792 主分类号 H01L29/792
代理机构 代理人
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