发明名称 |
Mask blank, transfer mask, and methods of manufacturing the same |
摘要 |
In a mask blank for manufacturing a transfer mask adapted to exposure light having a wavelength of 200 nm or less, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a highly oxidized layer which has an oxygen content of 60 at % or more and which is formed as a surface layer of the light-shielding film, that is placed on a side opposite to a transparent substrate side. |
申请公布号 |
US8435704(B2) |
申请公布日期 |
2013.05.07 |
申请号 |
US20100875783 |
申请日期 |
2010.09.03 |
申请人 |
NOZAWA OSAMU;SHISHIDO HIROAKI;HOYA CORPORATION |
发明人 |
NOZAWA OSAMU;SHISHIDO HIROAKI |
分类号 |
G03F1/22;C23C14/06;C23C14/08;G03F1/50;G03F1/54 |
主分类号 |
G03F1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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