发明名称 Exposure apparatus, and device manufacturing method
摘要 An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. Substrates can be held on first and second tables. The first and second tables are moved together so as to transit from a first state to a second state, the first state in which the liquid immersion is maintained between the projection system and one of the first and second tables, the second state in which the liquid immersion is maintained between the projection system and the other one of the first and second tables. During the transition, the liquid immersion is maintained just below the projection system.
申请公布号 US8436979(B2) 申请公布日期 2013.05.07
申请号 US20100923718 申请日期 2010.10.05
申请人 EBIHARA AKIMITSU;NIKON CORPORATION 发明人 EBIHARA AKIMITSU
分类号 G03B27/42;G03B27/52;G03F7/20 主分类号 G03B27/42
代理机构 代理人
主权项
地址