发明名称 3D STRUCTURED NON-VOLATILE MEMORY DEVICE ANE METHOD FOR MANUFACTURING THE SAME
摘要 <p>PURPOSE: A 3D structured non-volatile memory device and a method for manufacturing the same are provided to secure an erase characteristic by generating a large amount of holes in an erasing operation. CONSTITUTION: Memory cells are laminated on a channel(P_CH, S_CH, D_CH). Word lines(WL) are laminated on a pipe gate(PG). A source line(SL) is connected to one end of the channel. A bit line(BL) is connected to the other end of the channel. A first junction(JN1) is formed between the source line and the one end of the channel. A P type impurity is doped into the first junction. A second junction(JN2) is formed between the bit line and the other end of the channel. An N type impurity is doped into the second junction.</p>
申请公布号 KR20130045622(A) 申请公布日期 2013.05.06
申请号 KR20110109947 申请日期 2011.10.26
申请人 SK HYNIX INC. 发明人 OH, SANG HYUN;SEIICHI ARITOME;LEE, SANG BUM
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
代理机构 代理人
主权项
地址