| 摘要 |
<p>PURPOSE: A manufacturing method of a resist composition for lithography is provided to prevent dissolving of gas in a filter, into the composition during filtering process, thereby suppressing generation of defects due to bubbles, in a coating film. CONSTITUTION: A manufacturing method of a resist composition for lithography comprises a step of filtering a resist composition for lithography; a step of maintaining vacuum pressure in a container(3) having the filter and allowing the resist composition for lithography to pass through the filter. In the filtering process, the filter is installed in the container. The container is cleaned by the cleaning liquid, and maintaining vacuum pressure in the container.</p> |
