| 摘要 |
PURPOSE: An etchant composition for a metal layer including a copper layer and/or a copper alloy layer and an etching method thereof are provided to etch a metal film and a laminated film to a high precision. CONSTITUTION: An etchant composition for a metal layer including a copper layer and/or a copper alloy layer and an etching method thereof includes cu(II) ion,β-alanine, and water. [Reference numerals] (AA) Cu/CuMn substrate J.E.T.(s); (BB) Copper ion concentration(mol/l)
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