| 摘要 |
A substrate processing apparatus includes a table, an eccentric cam mechanism, a reference mark, an imaging unit, and a controller. The table is for positioning a substrate. The eccentric cam mechanism includes an eccentric cam configured to move the table by a rotation. The reference mark moves in accordance with a movement of the table. The imaging unit is configured to image the reference mark. The controller is configured to rotate the eccentric cam to move the table, image the reference mark moving in accordance with the movement of the table by the imaging unit to measure a movement amount of the table with respect to the rotation of the eccentric cam, and rotate the eccentric cam in accordance with the measured movement amount to position the substrate at a time of positioning the substrate.
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