| 摘要 |
An optical arrangement, e.g. projection lens, for EUV lithography, provided with: a first optical element (22) having a reflective surface (31a) and a first substrate (32) composed of TiO2-doped quartz glass, which has a temperature-dependent coefficient of thermal expansion having a zero crossing at a first zero crossing temperature (TZC1), and a second optical element (24) having a reflective surface (36a) and a second substrate (37) composed of TiO2-doped quartz glass, which has a temperature-dependent coefficient of thermal expansion having a zero crossing at a second zero crossing temperature (TZC2), which is different from the first. A gradient of the coefficient of thermal expansion of the first substrate (32) at the first zero crossing temperature (TZC1) and/or a gradient of the coefficient of thermal expansion of the second substrate (37) at the second zero crossing temperature (TZC2) have/has a negative sign. |
