| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method which effectively jet a supercritical fluid to multiple substrates. <P>SOLUTION: A substrate processing apparatus according to one embodiment of this invention includes: a housing 4100 providing a space where processing is performed; and multiple support members 4320 which are disposed in the housing 4100 so as to be spaced away from each other in the vertical direction and respectively support edges of multiple substrates S. <P>COPYRIGHT: (C)2013,JPO&INPIT |
