发明名称 |
RADIATION-SENSITIVE COMPOSITION |
摘要 |
A radiation-sensitive composition includes a low-molecular-weight compound, a solvent and a radiation-sensitive acid-generator other than the low-molecular-weight compound. The low-molecular-weight compound has one or more acid-dissociable groups which decompose by an action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule. The low-molecular-weight compound has a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000. The low-molecular-weight compound is not obtained from chain growth polymerization of a monomer with an unsaturated bond. A content of the low-molecular-weight compound is 80 mass % or more of 100 mass % of a total solid component of the radiation-sensitive composition. The low-molecular-weight compound is a compound shown by a following formula (1).
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申请公布号 |
US2013108962(A1) |
申请公布日期 |
2013.05.02 |
申请号 |
US201213719264 |
申请日期 |
2012.12.19 |
申请人 |
JSR CORPORATION;JSR CORPORATION |
发明人 |
MATSUMURA NOBUJI;SHIMIZU DAISUKE;KAI TOSHIYUKI |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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