发明名称 |
QUANTUM CASCADE LASER MANUFACTURING METHOD |
摘要 |
This quantum cascade laser manufacturing method comprises: a step in which a resin stamper (201) having a second groove pattern (P2) is produced by pressing a mother stamper against a flexible resin film; a step in which a wafer in which an active layer is formed on a semiconductor substrate is produced; a step in which a resist film (304) is formed on the active-layer-side surface of the wafer; a step in which a third groove pattern (P3) is formed on the resist film (304) by pressing the resin stamper against the resist film (304) by means of an air pressure; and a step in which a diffraction grating is formed on a wafer surface by etching the wafer while using the resist film (304) as a mask. |
申请公布号 |
WO2013061656(A1) |
申请公布日期 |
2013.05.02 |
申请号 |
WO2012JP67116 |
申请日期 |
2012.07.04 |
申请人 |
HAMAMATSU PHOTONICS K.K.;SUGIYAMA ATSUSHI;AKIKUSA NAOTA;EDAMURA TADATAKA |
发明人 |
SUGIYAMA ATSUSHI;AKIKUSA NAOTA;EDAMURA TADATAKA |
分类号 |
H01S5/12;B29C33/40;B29C59/02;H01L21/027;H01S5/0687 |
主分类号 |
H01S5/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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