发明名称 |
Liquid Chemical for Forming Protective Film, and Cleaning Method for Wafer Surface |
摘要 |
Disclosed is a liquid chemical for forming a water repellent protective film at least on surfaces of recessed portions of a metal-based wafer, the liquid chemical for forming a water repellent protective film being characterized by comprising a surfactant which has an HLB value of 0.001-10 according to Griffin's method and includes a hydrophobic moiety having a C6-C18 hydrocarbon group and water, and characterized in that the concentration of the surfactant in the liquid chemical is not smaller than 0.00001 mass % and not larger than the saturated concentration relative to 100 mass % of the total amount of the liquid chemical. This liquid chemical can improve a cleaning step which tends to induce a metal-based wafer to cause a pattern collapse.
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申请公布号 |
US2013104931(A1) |
申请公布日期 |
2013.05.02 |
申请号 |
US201113807708 |
申请日期 |
2011.06.15 |
申请人 |
ARATA SHINOBU;SAITO MASANORI;SAIO TAKASHI;KUMON SOICHI;NANAI HIDEHISA;CENTRAL GLASS COMPANY, LIMITED |
发明人 |
ARATA SHINOBU;SAITO MASANORI;SAIO TAKASHI;KUMON SOICHI;NANAI HIDEHISA |
分类号 |
C09D5/38 |
主分类号 |
C09D5/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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