<p>This vapor deposition device is equipped with: a susceptor (120) on which a substrate to be treated (10) is mounted; a gas supply unit (130) that faces the susceptor (120) and supplies multiple material gases to the substrate to be treated (10); multiple mixing pipes for mixing multiple predetermined material gases among the multiple material gases, and for introducing the respective mixed gases to the gas supply unit (130); and multiple gas-branching mechanisms for branching the multiple material gases while regulating the flow rates of the respective material gases, and for sending each of the branched material gases to any one of the multiple mixing pipes. The gas supply unit (130) sprays the multiple mixed gases, which have been respectively mixed in the multiple mixing pipes, respectively into multiple areas provided on the susceptor (120). The concentrations and flow rates of the respective predetermined multiple material gases are respectively regulated for the multiple mixed gases.</p>
