| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a design method of an electric charge beam lithography device which inhibits an electric charge optical lens tube from inclining due to asymmetric deformation of a housing which results from atmospheric pressure fluctuations and enables highly accurate lithography. <P>SOLUTION: A design method of an electronic beam lithography device, having at least a housing having an XY stage, on which a sample is placed, therein and an electronic optical lens tube radiating an electronic beam to the sample, includes the steps of: analyzing deformation of a top plate of a housing due to atmospheric pressure changes (S101); detecting a position where the smallest inclination of the top plate of the housing is observed on the basis of the analysis (S102); and disposing the electronic optical lens tube at the detected position (S103). <P>COPYRIGHT: (C)2013,JPO&INPIT |
