MONOMER COUPLED WITH THERMAL ACID GENERATOR, POLYMER GAINED FROM MONOMER COUPLED WITH THERMAL ACID GENERATOR, COMPOSITION FOR RESIST UNDERLAYER FILM INCLUDING POLYMER, AND METHOD FOR FORMING PATTERN USING COMPOSITION FOR RESIST UNDERLAYER FILM

摘要

A composition for a resist underlayer film including a thermal acid generator, a polymer gained from a monomer coupled with a thermal acid generator, a composition for a resist underlayer film including the polymer, and a method for forming a pattern using the composition for the resist underlayer film.