发明名称 PROCESS FOR PRODUCING Si(1-v-w-x)CwAlxNv BASE MATERIAL, PROCESS FOR PRODUCING EPITAXIAL WAFER, Si(1-v-w-x)CwAlxNv BASE MATERIAL, AND EPITAXIAL WAFER
摘要 Si(1-v-w-x)CwAlxNv crystals in a mixed crystal state are formed. A method for manufacturing an easily processable Si(1-v-w-x)CwAlxNv substrate, a method for manufacturing an epitaxial wafer, a Si(1-v-w-x)CwAlxNv substrate, and an epitaxial wafer are provided. A method for manufacturing a Si(1-v-w-x)CwAlxNv substrate 10a includes the following steps. First, a Si substrate 11 is prepared. A Si(1-v-w-x)CwAlxNv layer 12 (0<v<1, 0@w<1, 0<x<1, and 0<v+w+x<1) is then grown on the Si substrate 11 by a pulsed laser deposition method.
申请公布号 US2013105858(A1) 申请公布日期 2013.05.02
申请号 US201213715254 申请日期 2012.12.14
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD.;SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 SATOH ISSEI;MIYANAGA MICHIMASA;FUJIWARA SHINSUKE;NAKAHATA HIDEAKI
分类号 H01L29/267 主分类号 H01L29/267
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