Sputtering target useful for coating substrates with a transparent conductive layer, comprises a gallium-doped zinc-containing material, which is metallic and has a further doping of a further material made of elements of a third main group

摘要

Sputtering target comprises a gallium-doped zinc-containing material, which is metallic and has at least one further doping of a further material made of elements of third main group. An independent claim is also included for producing the sputtering target, comprising doping zinc with gallium and the further element of the third main group.