| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an acid generator that composes a resist composition in which line edge roughness (LER) is excellent when manufacturing a resist pattern. <P>SOLUTION: A hydroxyl aromatic derivative has a group shown by formula (1). In the formula, Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>identically or differently denote a fluorine atom or a 1-6C perfluoroalkyl group; L<SP POS="POST">1</SP>denotes a 1-17C divalent aliphatic saturated hydrocarbon group, wherein a methylene group that composes the divalent aliphatic saturated hydrocarbon group may be replaced with an oxygen atom or a carbonyl group; Z<SP POS="POST">+</SP>denotes an organic cation; and * denotes a bond with a hydroxyl aromatic ring. <P>COPYRIGHT: (C)2013,JPO&INPIT |
