发明名称 Method of forming a semiconductor device
摘要 Method for producing a semiconductor device such as an organic thin film transistor, and a device produced by the method, the method including the steps of forming conducting electrodes over a substrate, treating a surface of the electrodes with an arene substituted with an electron-withdrawing group to form an electrode contact layer over the electrodes, and forming an organic semiconductor layer over the substrate and electrodes, in which the substrate and electrodes are baked before the organic semiconductor layer is formed so as to reduce contaminants on the electrode contact layer and thereby promote improved crystal nucleation on a surface of the electrode.
申请公布号 GB201304905(D0) 申请公布日期 2013.05.01
申请号 GB20130004905 申请日期 2011.06.30
申请人 CAMBRIDGE DISPLAY TECHNOLOGY LIMITED 发明人
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