发明名称 SIMULTANEOUS AND SELECTIVE PARTITIONING OF VIA STRUCTURES USING PLATING RESIST
摘要 <p>Systems and methods for simultaneously partitioning a plurality of via structures into electrically isolated portions by using plating resist within a PCB stackup are disclosed. Such via structures are made by selectively depositing plating resist in one or more locations in a sub-composite structure. A plurality of sub-composite structures with plating resist deposited in varying locations are laminated to form a PCB stackup of a desired PCB design. Through-holes are drilled through the PCB stackup through conductive layers, dielectric layers and through the plating resist. Thus, the PCB panel has multiple through-holes that can then be plated simultaneously by placing the PCB panel into a seed bath, followed by immersion in an electroless copper bath. Such partitioned vias increase wiring density and limit stub formation in via structures. Such partitioned vias allow a plurality of electrical signals to traverse each electrically isolated portion without interference from each other.</p>
申请公布号 EP1856723(B1) 申请公布日期 2013.05.01
申请号 EP20060737501 申请日期 2006.03.06
申请人 SANMINA-SCI CORPORATION 发明人 DUDNIKOV, GEORGE, JR.
分类号 H05K3/42;H05K1/02;H05K1/16;H05K3/18 主分类号 H05K3/42
代理机构 代理人
主权项
地址