Optical measurement system and method for measuring critical dimension of nanostructure

摘要

An optical measurement system (100) for measuring a critical dimension having a nanostructured surface including a nanostructure formed on a plane. The optical measurement system includes an image recording module (120) including a microscope optical system which records a defocused image having an nonuniform degree of defocusing with respect to the nanostructured surface, an optical scheme parameter control module (110) which sets and outputs to the microscope optical system optical scheme parameters for the microscope optical system, an image calculation module (130) which receives receiving the optical scheme parameters set by the optical scheme parameter control module and calculates an image of the nanostructured surface, and a comparison module (140) which compares the defocused image recorded by the image recording module and the image calculated by the image calculation module.