发明名称 Modified novolak phenolic resin, making method, and resist composition
摘要 <p>A modified novolak phenolic resin is obtained by reacting a novolak phenolic resin containing at least 50 wt% of p-cresol with a crosslinker. This method increases the molecular weight of the existing novolak phenolic resin containing at least 50 wt% of p-cresol to such a level that the resulting modified novolak phenolic resin has heat resistance enough for the photoresist application.</p>
申请公布号 EP2586806(A2) 申请公布日期 2013.05.01
申请号 EP20120189273 申请日期 2012.10.19
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 HIRANO, YOSHINORI;YANAGISAWA, HIDEYOSHI
分类号 C08G8/00;C08L61/00;C08L61/04;C08L61/20;G03F7/00;H01B3/00;H05B33/00;H05K1/00 主分类号 C08G8/00
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