发明名称 COMPOSITION FOR FORMATION OF TOP ANTIREFLECTIVE FILM, AND PATTERN FORMATION METHOD USING THE COMPOSITION
摘要 DISCLOSED IS A COMPOSITION FOR FORMING A TOP ANTIREFLECTIVE FILM, WHICH COMPRISES AT LEAST ONE FLUORINE-CONTAINING COMPOUND AND A QUATERNARY AMMONIUM COMPOUND REPRESENTED BY THE FORMULA (1) [WHEREIN AT LEAST ONE OF RT, R2, R3,AND R4 REPRESENTS A HYDROXYL GROUP OR AN ALKANOL GROUP, AND THE OTHERS INDEPENDENTLY REPRESENT A HYDROGEN OR AN ALKYL GROUP HAVING 1 TO 10 CARBON ATOMS; AND X- REPRESENTS A HYDROXYL GROUP, A HALIDE ION OR A SULFATE ION], AND OPTIONALLY A WATER-SOLUBLE POLYMER, AN ACID, A SURFACTANT AND AN AQUEOUS SOLVENT. THE COMPOSITION FOR FORMING A TOP ANTIREFLECTIVE FILM CAN EXHIBIT THE SAME LEVELS OF FUNCTIONS AS THOSE OF CONVENTIONAL TOP ANTIREFLECTIVE FILM-FORMING COMPOSITIONS WHEN APPLIED IN A SMALLER AMOUNT. [GENERAL FORMULA (1)]
申请公布号 MY148549(A) 申请公布日期 2013.04.30
申请号 MY2010PI02446 申请日期 2008.12.10
申请人 AZ ELECTRONIC MATERIALS IP(JAPAN) K K 发明人 AKIYAMA YASUSHI;NOYA GO;KURAMOTO KATSUTOSHI;TAKANO YUSUKE
分类号 H01L21/027 主分类号 H01L21/027
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