| 摘要 |
THE INVENTION PROVIDES A POLISHING PAD FOR CHEMICAL-MECHANICAL POLISHING COMPRISING A POLYMERIC MATERIAL COMPRISING TWO OR MORE ADJACENT REGIONS, WHEREIN THE REGIONS HAVE THE SAME POLYMER FORMULATION AND THE TRANSITION BETWEEN THE REGIONS DOES NOT INCLUDE A STRUCTURALLY DISTINCT BOUNDARY. IN A FIRST EMBODIMENT, A FIRST REGION AND A SECOND ADJACENT REGION HAVE A FIRST AND SECOND NON-ZERO VOID VOLUME, RESPECTIVELY, WHEREIN THE FIRST VOID VOLUME IS LESS THAN THE SECOND VOID VOLUME. IN A SECOND EMBODIMENT, A FIRST NON-POROUS REGION IS ADJACENT TO A SECOND ADJACENT POROUS REGION, WHEREIN THE SECOND REGION HAS AN AVERAGE PORE SIZE OF 50?m OR LESS. IN A THIRD EMBODIMENT, AT LEAST TWO OF AN OPTICALLY TRANSMISSIVE REGION, A FIRST POROUS REGION, AND AN OPTIONAL SECOND POROUS REGION, ARE ADJACENT. THE INVENTION FURTHER PROVIDES METHODS OF POLISHING A SUBSTRATE COMPRISING THE USE OF THE POLISHING PADS AND A METHOD OF PRODUCING THE POLISHING PADS. |
