发明名称 Trench MOS barrier schottky rectifier with a planar surface using CMP techniques
摘要 High Efficiency Diode (HED) rectifiers with improved performance including reduced reverse leakage current, reliable solderability properties, and higher manufacturing yields are fabricated by minimizing topography variation at various stages of fabrication. Variations in the topography are minimized by using a CMP process to planarize the HED rectifier after the field oxide, polysilicon and/or solderable top metal are formed.
申请公布号 US8432000(B2) 申请公布日期 2013.04.30
申请号 US20100819023 申请日期 2010.06.18
申请人 GREBS THOMAS E.;FAIRCHILD SEMICONDUCTOR CORPORATION 发明人 GREBS THOMAS E.
分类号 H01L21/70 主分类号 H01L21/70
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