| 摘要 |
The invention provides a substrate processing device capable of inhibiting the macrotype of the device and the increasing of occupation area. A plurality of processing chambers (30) for the vacuum treatment of substrates are arranged at the periphery of a vacuum conveying chamber (13) maintained to be in a vacuum environment. The processing chamber (30) is configured to be capable of opening or closing the upper opening of a vessel main body (31) via a cover body (32). A cover body opening and closing mechanism (6) is arranged to be moved along the periphery of the vacuum conveying chamber (13). The cover body (32) is equipped with a holding part (5). The cover body (32) is lifted from the processing chamber (30) by enabling the cover body of the cover body opening and closing mechanism (6) to be lifted at the opening or closing position. |
