发明名称 INTEGRATED CIRCUIT SYSTEM WITH DOUBLE DOPED DRAIN TRANSISTOR
摘要 <p>INTEGRATED CIRCUIT SYSTEM WITH DOUBLE DOPED DRAIN TRANSISTORAn integrated circuit system . eludes a substrate, forming a gate over the substrate, forming a first drift region having a first counter diffused region and a source diffused region, the first drift region in the substrate adjacent a first side of the gate, and forming a second drift region having a second counter diffused region and a drain diffused region, the second drift region in the substrate adjacent a second side of the gate opposite the first side of the gate. Figure 1</p>
申请公布号 SG188830(A1) 申请公布日期 2013.04.30
申请号 SG20130015078 申请日期 2007.03.08
申请人 GLOBALFOUNDRIES SINGAPORE PTE. LTD. 发明人 LI YISUO;CHEN GANG;FRANCIS BENISTANT;PURAKH RAJ VERMA;YANG HONG;CHU SHAO-FU SANFORD
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