发明名称 |
INSPECTION APPARATUS, LITHOGRAPHIC APPARATUS, ANDDEVICE MANUFACTURING METHOD |
摘要 |
<p>-36-INSPECTION APPARATUS, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD AB S TRACTAn inspection apparatus includes an illumination system configured to receive a first beam and to produce second and third beams from the first beam, and a catadioptric objective configured to direct the second beam to reflect from a wafer. The inspection apparatus includes a first sensor configured to detect a first image created by the reflected second beam. The inspection apparatus also includes a refractive objective configured to direct the third beam to reflect from the wafer, and a second sensor configured to detect a second image created by the reflected third beam. In one embodiment, the first and second images can be used for CD measurements. In one embodiment, the second beam has a spectral range from about 200 nm to about 425 nm, and the third beam has a spectral range from about 425 nm to about 850 nm. The inspection apparatus can also include a third sensor configured to detect a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements.(Figure 5)</p> |
申请公布号 |
SG188737(A1) |
申请公布日期 |
2013.04.30 |
申请号 |
SG20120066411 |
申请日期 |
2012.09.07 |
申请人 |
ASML HOLDING N.V. |
发明人 |
SMIRNOV, STANISLAV Y.;RYZHIKOV, LEV;CATEY, ERIC, BRIAN;JOOBEUR, ADEL;HEALD, DAVID;SHMAREV, YEVGENIY, KONSTANTINOVICH;JACOBS, RICHARD, DAVID |
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