PHOTOMASK BLANK, PHOTOMASK, AND MAKING METHOD

摘要

Photomask Blank, Photomask, and Making MethodIn a photomask blank comprising a transparent substrate, an optical film of material containing a transition metal and silicon, and a hard mask film, the hardio mask film is a multilayer film including a first layer of a chromium-based material containing 20-60 atom% of oxygen and a second layer of a chromium-based material containing at least 50 atom% of chromium and less than 20 atom % of oxygen. The hard mask film having a thickness of 2.0 nm to less than15 10 nm is resistant to fluorine dry etching.Fig. 2