PLASMA EQUIPMENT AND MAINTENANCE METHOD OF THE SAME

摘要

PURPOSE: A plasma facility and a managing method thereof are provided to increase or maximize productivity by processing the information of the generation of the arcing or hunting in a plasma reaction. CONSTITUTION: A chamber(10) induces a plasma reaction(12). A detector(20) detects a spectrum signal from the plasma reaction inside the chamber. A control part(30) controls reaction gas which directly affects the plasma reaction. A regulation part(40) outputs a regulation signal regulating the control part. A plasma monitoring module(50) determines the generation of the arcing or hunting of the plasma reaction with the variation of the amplitude of the spectrum signal. [Reference numerals] (32) Flow rate control part; (34) High frequency adjustment part; (40) Control part; (50) Plasma monitoring module;