| 摘要 |
PURPOSE: A substrate cleaning method and a substrate cleaning apparatus are provided to improve cleaning performance by reducing a load of a scrub cleaning member. CONSTITUTION: A substrate maintaining and supporting unit(34) rotates a substrate. A scrub cleaning member(40) scrubs and cleans the surface of the substrate. A 2 fluid nozzle(70) cleans the surface of the substrate with a 2 fluid jet without a contact. A moving arm(58) simultaneously moves the scrub cleaning member and the 2 fluid nozzle. An arm moving device(54) moves the moving arm.
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