发明名称 |
APPARATUS AND METHODS FOR DEPOSITION REACTORS |
摘要 |
<p>An apparatus, such as an ALD (Atomic Layer Deposition) apparatus, including a precursor source configured for depositing material on a heated substrate in a deposition reactor by sequential self-saturating surface reactions. The apparatus includes an in-feed line for feeding precursor vapor from the precursor source to a reaction chamber and a structure configured for utilizing heat from a reaction chamber heater for preventing condensation of precursor vapor into liquid or solid phase between the precursor source and the reaction chamber. Also various other apparatus and methods are presented.</p> |
申请公布号 |
KR20130043244(A) |
申请公布日期 |
2013.04.29 |
申请号 |
KR20137008555 |
申请日期 |
2009.04.15 |
申请人 |
PICOSUN OY |
发明人 |
LINDFORS SVEN;SOININEN PEKKA J. |
分类号 |
C23C16/455;C23C16/44;C30B25/08;C30B25/16 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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