| 摘要 |
PURPOSE: A substrate processing device is provided to uniformly maintain temperature of the inner part of a main body by distributing atmosphere gas for each part of the main body. CONSTITUTION: A chamber, which processes a substrate, is formed in a main body(110). A plurality of heaters(120) generates heat for processing the substrate. A plurality of emission holes is formed in a plurality of gas supply pipes. The plurality of gas supply pipes supplies atmosphere gas to an inner part of the main body. A gas emission pipe(140) absorbs and emits the atmosphere gas.
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