PLASMA PROCESSING APPARATUS

摘要

PURPOSE: A plasma processing apparatus is provided to suppress plasma potential and to increase uniformity of plasma density distribution in the longitudinal direction of an antenna. CONSTITUTION: An antenna(30) puts two rectangular conductive plates close by opening a gap(34) to be arranged on the same plane. The antenna has a reciprocal conductive structure connecting one end in a longitudinal X direction of the two conductive plates with a conductor(33). The two conductive plates make high frequency current flow in the opposite directions. An opening(37) is formed in a side of the two conductive plates and is distributed in the longitudinal X direction of a plurality of antennae.