发明名称 OVERHEAD ELECTRON BEAM SOURCE FOR PLASMA ION GENERATION IN A WORKPIECE PROCESSING REGION
摘要 A plasma reactor has a main chamber for processing a workpiece in a processing region bounded between an overhead ceiling and a workpiece support surface, the reactor having an overhead electron beam source that produces an electron beam flowing into the processing region through the ceiling of the main chamber.
申请公布号 WO2013059097(A1) 申请公布日期 2013.04.25
申请号 WO2012US60052 申请日期 2012.10.12
申请人 APPLIED MATERIALS, INC.;RAMASWAMY, KARTIK;BERA, KALLOL;COLLINS, KENNETH, S.;RAUF, SHAHID 发明人 RAMASWAMY, KARTIK;BERA, KALLOL;COLLINS, KENNETH, S.;RAUF, SHAHID
分类号 H05H1/24;H01L21/205 主分类号 H05H1/24
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