发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To obtain a semiconductor device which achieves rapid rising of a current at the time of turning-on and which is capable of monolithically constituting an inverter with an n-type HEMT without requiring a complicated process. <P>SOLUTION: A p-type GaN transistor comprises: a hole supply layer 22a of a first polarity; a hole transit layer 22b of a second polarity formed on the hole supply layer 22a and having a recess 22ba; and a gate electrode 29 formed above the hole transit layer 22b and in the recess 22ba. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013077630(A) 申请公布日期 2013.04.25
申请号 JP20110215348 申请日期 2011.09.29
申请人 FUJITSU LTD 发明人 IMADA TADAHIRO
分类号 H01L21/338;H01L21/336;H01L27/095;H01L29/778;H01L29/78;H01L29/786;H01L29/812;H03F3/20 主分类号 H01L21/338
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